Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon

Rodrigo Ferrão de Paiva Martins; Elvira Maria Correia Fortunato

doi:10.1007/978-3-662-04141-3_8

Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon

Rodrigo Ferrão de Paiva Martins, Elvira Maria Correia Fortunato

DCM - Departamento de Ciência dos Materiais

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Abstract

This chapter is a review of ID, 2D and 3D thin film position sensitive detectors (TFPSD) made with hydrogenated amorphous silicon. Examples of different types of TFPSD are given, including the technological implications of the fabrication process and the physics ruling their behaviors. A detailed numerical analysis and electro-optical characterization is made for large area thin film position sensitive detectors and linear array devices, including the peripherals to be used in measurement/inspection systems.

Original language	English
Title of host publication	Thin film position sensitive detectors: from 1D to 3D applications
Subtitle of host publication	The Technology and Applications of Amorphous Silicon
Editors	Robert Street
Publisher	Springer Intrnational
Pages	342-403
Number of pages	62
Volume	37
Edition	1st edition
ISBN (Electronic)	978-3-662-04141-3
ISBN (Print)	978-3-642-08499-7
DOIs	https://doi.org/10.1007/978-3-662-04141-3_8
Publication status	Published - 14 Apr 2000

Keywords

Reverse Bias
Plasma Enhance Chemical Vapor Deposition
Light Spot
Resistive Layer
Equivalent Electric Circuit

Access to Document

10.1007/978-3-662-04141-3_8

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Martins, R. F. D. P., & Fortunato, E. M. C. (2000). Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. In R. Street (Ed.), Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon (1st edition ed., Vol. 37, pp. 342-403 ). Springer Intrnational. https://doi.org/10.1007/978-3-662-04141-3_8

Martins, Rodrigo Ferrão de Paiva ; Fortunato, Elvira Maria Correia. / Thin film position sensitive detectors: from 1D to 3D applications : The Technology and Applications of Amorphous Silicon. Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. editor / Robert Street. Vol. 37 1st edition. ed. Springer Intrnational, 2000. pp. 342-403

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abstract = "This chapter is a review of ID, 2D and 3D thin film position sensitive detectors (TFPSD) made with hydrogenated amorphous silicon. Examples of different types of TFPSD are given, including the technological implications of the fabrication process and the physics ruling their behaviors. A detailed numerical analysis and electro-optical characterization is made for large area thin film position sensitive detectors and linear array devices, including the peripherals to be used in measurement/inspection systems.",

keywords = "Reverse Bias, Plasma Enhance Chemical Vapor Deposition, Light Spot, Resistive Layer, Equivalent Electric Circuit",

author = "Martins, {Rodrigo Ferr{\~a}o de Paiva} and Fortunato, {Elvira Maria Correia}",

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Martins, RFDP & Fortunato, EMC 2000, Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. in R Street (ed.), Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. 1st edition edn, vol. 37, Springer Intrnational, pp. 342-403 . https://doi.org/10.1007/978-3-662-04141-3_8

Thin film position sensitive detectors: from 1D to 3D applications : The Technology and Applications of Amorphous Silicon. / Martins, Rodrigo Ferrão de Paiva ; Fortunato, Elvira Maria Correia.

Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. ed. / Robert Street. Vol. 37 1st edition. ed. Springer Intrnational, 2000. p. 342-403 .

Research output: Chapter in Book/Report/Conference proceeding › Chapter

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N2 - This chapter is a review of ID, 2D and 3D thin film position sensitive detectors (TFPSD) made with hydrogenated amorphous silicon. Examples of different types of TFPSD are given, including the technological implications of the fabrication process and the physics ruling their behaviors. A detailed numerical analysis and electro-optical characterization is made for large area thin film position sensitive detectors and linear array devices, including the peripherals to be used in measurement/inspection systems.

AB - This chapter is a review of ID, 2D and 3D thin film position sensitive detectors (TFPSD) made with hydrogenated amorphous silicon. Examples of different types of TFPSD are given, including the technological implications of the fabrication process and the physics ruling their behaviors. A detailed numerical analysis and electro-optical characterization is made for large area thin film position sensitive detectors and linear array devices, including the peripherals to be used in measurement/inspection systems.

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KW - Plasma Enhance Chemical Vapor Deposition

KW - Light Spot

KW - Resistive Layer

KW - Equivalent Electric Circuit

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BT - Thin film position sensitive detectors: from 1D to 3D applications

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Martins RFDP , Fortunato EMC. Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. In Street R, editor, Thin film position sensitive detectors: from 1D to 3D applications: The Technology and Applications of Amorphous Silicon. 1st edition ed. Vol. 37. Springer Intrnational. 2000. p. 342-403 https://doi.org/10.1007/978-3-662-04141-3_8