Abstract
This chapter is a review of ID, 2D and 3D thin film position sensitive detectors (TFPSD) made with hydrogenated amorphous silicon. Examples of different types of TFPSD are given, including the technological implications of the fabrication process and the physics ruling their behaviors. A detailed numerical analysis and electro-optical characterization is made for large area thin film position sensitive detectors and linear array devices, including the peripherals to be used in measurement/inspection systems.
Original language | English |
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Title of host publication | Thin film position sensitive detectors: from 1D to 3D applications |
Subtitle of host publication | The Technology and Applications of Amorphous Silicon |
Editors | Robert Street |
Publisher | Springer Intrnational |
Pages | 342-403 |
Number of pages | 62 |
Volume | 37 |
Edition | 1st edition |
ISBN (Electronic) | 978-3-662-04141-3 |
ISBN (Print) | 978-3-642-08499-7 |
DOIs | |
Publication status | Published - 14 Apr 2000 |
Keywords
- Reverse Bias
- Plasma Enhance Chemical Vapor Deposition
- Light Spot
- Resistive Layer
- Equivalent Electric Circuit