@inproceedings{c7de40666a5a44f68e52a79bf08bd9a6,
title = "Thickness and roughness measurements in poly(o-methoxyaniline) layer-by-layer films using AFM",
abstract = "The atomic force microscopy (AFM) is employed to monitor the buildup of layer-by-layer films of poly(o-methoxyaniline) (POMA) and poly(ethenesulfonic acid) (PVS) onto several substrates. Using the contact mode of an AFM, we produced a furrow on the film, which was made possible because the film material is less stiff than the substrate and the silicon tip. Film thickness could then be measured using the tapping mode. The thickness and adsorbed amount of POMA/PVS increase linearly after several bilayers have been deposited, while the roughness increases with the number of bilayers until reaching a saturation value. This behavior was attributed to the ability these polymers possess to aggregate, which was confirmed by an analysis of grain sizes.",
author = "M. Raposo and Lobo, {R. F. M.} and Silva, {M. A. Pereira da} and Faria, {R. M.} and {Oliveira Jr.}, {O. N.}",
note = "The authors acknowledge the financial support from FAPESP, CNPq (Brazil) and Funda{\c c}{\~a}o para a Ci{\^e}ncia e Tecnologia (Portugal). ; 10th International Symposium on Electrets (ISE 10) ; Conference date: 22-09-1999 Through 24-09-1999",
year = "1999",
doi = "10.1109/ISE.1999.832102",
language = "English",
isbn = "0-7803-5025-1 ",
series = "International Symposium on Electrets (ISI)",
publisher = "Institute of Electrical and Electronics Engineers (IEEE)",
pages = "533--536",
editor = "Konsta, {A. A.} and A. Vassilikou-Dova and K. Vartzeli-Nikaki",
booktitle = "1999 10th International Symposium on Electrets",
address = "United States",
}