A transparent vanadium oxide film has been one of the most studied electrochromic (EC) and Thermochromic (TC) materials. Vanadium oxide films were deposited at different substrate temperatures up to 400 degrees C and different ratios of the oxygen partial pressure (P-O2). SEM, AFM and X-ray diffiraction's results show detail structure data of the films. IR mode assignments of the films measured by IR reflection-absorbance in NGIA, (near grazing incidence angle) are given. It is found that the film has V2O5 and VO2 combined structures. The films exhibit clear changes in transmittance when the environment temperature (T-e) is varied, especially in the 3600-4000 cm(-1) range. Applying a T-e that is higher than a critical temperature (T-c) to the samples, the as-RT (room temperature) deposited film with 9% P-O2 has a transmittance variation of 30%, but the films that were deposited on a heated substrate of 400 degrees C have little variation. There is tendency of bigger variation in transmittance for the sample deposited at a larger P-O2, when it is applied by 200 degrees C T-e.
|Title of host publication||THIN SOLID FILMS|
|Number of pages||5|
|Publication status||Published - 15 Feb 2008|
|Event||Symposium on Advances in Transparents Electronics held at the European-Materials-Research-Society Meeting - |
Duration: 1 Jan 2006 → …
|Conference||Symposium on Advances in Transparents Electronics held at the European-Materials-Research-Society Meeting|
|Period||1/01/06 → …|