TY - JOUR
T1 - The properties of a-Si
T2 - H films deposited on Mylar substrates by hot-wire plasma assisted technique
AU - Ferreira, Isabel
AU - Fortunato, Elvira
AU - Pereira, Luís
AU - Costa, M. Elisabete V
AU - Martins, Rodrigo
PY - 2002/4
Y1 - 2002/4
N2 - In this work we studied the influence of hydrogen dilution, rf power, and the filament and substrate temperatures on the electro-optical properties and composition of a-Si:H films produced by hot wire plasma assisted technique. The a-Si:H films were produced on Mylar substrates with growth rate of up to 37 Å/s, ημτ product of 1.6 × 10-7 cm2/V, photoconductivity to dark conductivity ratio of 1 × 104 (at AM1.5 radiation), and a dark conductivity of about 10-10 (Ω cm)-1 for substrate temperature of 130 °C, hydrogen dilution of 99%, filament temperature of 1700 °C, and rf power of 100 W.
AB - In this work we studied the influence of hydrogen dilution, rf power, and the filament and substrate temperatures on the electro-optical properties and composition of a-Si:H films produced by hot wire plasma assisted technique. The a-Si:H films were produced on Mylar substrates with growth rate of up to 37 Å/s, ημτ product of 1.6 × 10-7 cm2/V, photoconductivity to dark conductivity ratio of 1 × 104 (at AM1.5 radiation), and a dark conductivity of about 10-10 (Ω cm)-1 for substrate temperature of 130 °C, hydrogen dilution of 99%, filament temperature of 1700 °C, and rf power of 100 W.
UR - http://www.scopus.com/inward/record.url?scp=0036539809&partnerID=8YFLogxK
U2 - 10.1016/S0022-3093(01)01173-5
DO - 10.1016/S0022-3093(01)01173-5
M3 - Article
AN - SCOPUS:0036539809
SN - 0022-3093
VL - 299-302
SP - 30
EP - 35
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
ER -