Substrate temperature influenced ZrO2 films for MOS devices

Paruchuri Kondaiah, S. V. Jagadish Chandra, Elvira Fortunato, Choi Chel Jong, G. Mohan Rao, D. V. Rama Koti Reddy, S. Uthanna

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

The effect of substrate temperature on the direct current magnetron-sputtered zirconium oxide (ZrO2) dielectric films was investigated. Stoichiometric of the ZrO2 thin films was obtained at an oxygen partial pressure of 4.0 × 10−2 Pa. X-ray diffraction studies revealed that the crystallite size in the layer was increased from 4.8 to 16.1 nm with increase of substrate temperature from 303 to 673 K. Metal-oxide-semiconductor devices were fabricated on ZrO2/Si stacks with Al gate electrode. The dielectric properties of ZrO2 layer and interface quality at ZrO2/Si were significantly influenced by the substrate temperature. The dielectric constant increased from 15 to 25, and the leakage current density decreased from 0.12 × 10−7 to 0.64 × 10−9 A cm−2 with the increase of substrate temperature from 303 to 673 K.

Original languageEnglish
Pages (from-to)541-546
Number of pages6
JournalSurface And Interface Analysis
Volume52
Issue number9
DOIs
Publication statusPublished - 1 Sep 2020

Keywords

  • conduction mechanism
  • dielectric constant
  • high-k
  • interface engineering
  • leakage current
  • sputtering

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