Sputtering of silicon nanopowders by an argon cluster ion beam

Xiaomei Zeng, Vasiliy Pelenovich, Zhenguo Wang, Wenbin Zuo, Sergey Belykh, Alexander Tolstogouzov, Dejun Fu, Xiangheng Xiao

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)
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Abstract

In this work an Ar + cluster ion beam with energy in the range of 10-70 keV and dose of 7.2 × 10 14 -2.3 × 10 16 cluster/cm 2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation.

Original languageEnglish
Pages (from-to)136-143
Number of pages8
JournalBeilstein Journal of Nanotechnology
Volume10
Issue number1
DOIs
Publication statusPublished - 1 Jan 2019

Keywords

  • Finite size effect
  • Gas cluster ion beam
  • Silicon nanoparticles
  • Smoothing effect
  • Sputtering

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