Simultaneous probing of phase transformations in Ni-Ti thin film Shape Memory Alloy by synchrotron radiation-based X-ray diffraction and Electrical Resistivity

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Abstract

Nickel-Titanium (Ni-Ti) thin film shape memory alloys (SMAs) have been widely projected as a novel material, which can be utilized in microdevices. Characterization of their physical properties and its correlation with phase transformations has been a challenging issue. In the present study, X-ray beam diffraction has been utilised to obtain the structural information at different temperatures while cooling. Simultaneously, electrical resistivity (ER) was measured in the phase transformation temperature range. The variation of ER and integral area of the individual diffraction peaks of the different phases as a function of temperature have been compared. A mismatch between the conventional interpretation of ER variation and the results of the XRD data has been clearly identified.
Original languageUnknown
Pages (from-to)35-38
JournalMaterials Characterization
Volume76
Issue numberNA
DOIs
Publication statusPublished - 1 Jan 2013

Keywords

    Cite this

    @article{d1a620b5cb564ee598aba9a72ec5877f,
    title = "Simultaneous probing of phase transformations in Ni-Ti thin film Shape Memory Alloy by synchrotron radiation-based X-ray diffraction and Electrical Resistivity",
    abstract = "Nickel-Titanium (Ni-Ti) thin film shape memory alloys (SMAs) have been widely projected as a novel material, which can be utilized in microdevices. Characterization of their physical properties and its correlation with phase transformations has been a challenging issue. In the present study, X-ray beam diffraction has been utilised to obtain the structural information at different temperatures while cooling. Simultaneously, electrical resistivity (ER) was measured in the phase transformation temperature range. The variation of ER and integral area of the individual diffraction peaks of the different phases as a function of temperature have been compared. A mismatch between the conventional interpretation of ER variation and the results of the XRD data has been clearly identified.",
    keywords = "XRD, shape memory alloys, electrical resistivity, thin film, Ni-Ti",
    author = "Mahesh, {Karimbi Koosappa} and Silva, {Rui Jorge Cordeiro} and {Braz Fernandes}, {Francisco Manuel}",
    note = "Sem pdf conforme despacho",
    year = "2013",
    month = "1",
    day = "1",
    doi = "10.1016/j.matchar.2012.11.009",
    language = "Unknown",
    volume = "76",
    pages = "35--38",
    journal = "Materials Characterization",
    number = "NA",

    }

    TY - JOUR

    T1 - Simultaneous probing of phase transformations in Ni-Ti thin film Shape Memory Alloy by synchrotron radiation-based X-ray diffraction and Electrical Resistivity

    AU - Mahesh, Karimbi Koosappa

    AU - Silva, Rui Jorge Cordeiro

    AU - Braz Fernandes, Francisco Manuel

    N1 - Sem pdf conforme despacho

    PY - 2013/1/1

    Y1 - 2013/1/1

    N2 - Nickel-Titanium (Ni-Ti) thin film shape memory alloys (SMAs) have been widely projected as a novel material, which can be utilized in microdevices. Characterization of their physical properties and its correlation with phase transformations has been a challenging issue. In the present study, X-ray beam diffraction has been utilised to obtain the structural information at different temperatures while cooling. Simultaneously, electrical resistivity (ER) was measured in the phase transformation temperature range. The variation of ER and integral area of the individual diffraction peaks of the different phases as a function of temperature have been compared. A mismatch between the conventional interpretation of ER variation and the results of the XRD data has been clearly identified.

    AB - Nickel-Titanium (Ni-Ti) thin film shape memory alloys (SMAs) have been widely projected as a novel material, which can be utilized in microdevices. Characterization of their physical properties and its correlation with phase transformations has been a challenging issue. In the present study, X-ray beam diffraction has been utilised to obtain the structural information at different temperatures while cooling. Simultaneously, electrical resistivity (ER) was measured in the phase transformation temperature range. The variation of ER and integral area of the individual diffraction peaks of the different phases as a function of temperature have been compared. A mismatch between the conventional interpretation of ER variation and the results of the XRD data has been clearly identified.

    KW - XRD

    KW - shape memory alloys

    KW - electrical resistivity

    KW - thin film

    KW - Ni-Ti

    U2 - 10.1016/j.matchar.2012.11.009

    DO - 10.1016/j.matchar.2012.11.009

    M3 - Article

    VL - 76

    SP - 35

    EP - 38

    JO - Materials Characterization

    JF - Materials Characterization

    IS - NA

    ER -