Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique

R. Martins, A. Maçarico, M. Vieira, I. Ferreira, E. Fortunato

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemistry

Physics & Astronomy