The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.
|Number of pages||5|
|Journal||Journal of Non-Crystalline Solids|
|Issue number||PART 2|
|Publication status||Published - May 1998|
- Crystallite silicon films
- Deposition conditions
- Hot wire technique