Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire

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Abstract

The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.

Original languageEnglish
Pages (from-to)901-905
Number of pages5
JournalJournal of Non-Crystalline Solids
Volume227-230
Issue numberPART 2
Publication statusPublished - May 1998

Keywords

  • Crystallite silicon films
  • Deposition conditions
  • Hot wire technique

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