Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire

Rodrigo Martins; Isabel Ferreira; Francisco Fernandes; Elvira Fortunato

Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire

Rodrigo Martins, Isabel Ferreira, Francisco Fernandes, Elvira Fortunato

DCM - Departamento de Ciência dos Materiais

Research output: Contribution to journal › Article

12 Citations (Scopus)

Abstract

The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.

Original language	English
Pages (from-to)	901-905
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	227-230
Issue number	PART 2
Publication status	Published - May 1998

Keywords

Crystallite silicon films
Deposition conditions
Hot wire technique

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title = "Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire",

abstract = "The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.",

keywords = "Crystallite silicon films, Deposition conditions, Hot wire technique",

author = "Rodrigo Martins and Isabel Ferreira and Francisco Fernandes and Elvira Fortunato",

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AU - Martins, Rodrigo

AU - Ferreira, Isabel

AU - Fernandes, Francisco

AU - Fortunato, Elvira

PY - 1998/5

Y1 - 1998/5

N2 - The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.

AB - The aim of this work is to study the role of hydrogen dilution and filament temperature on the properties of nanocrystalline silicon thin films (undoped and doped) produced by the hot wire technique. These deposition parameters are correlated to the film's structure, composition and electro-optical properties with special emphasis on boron doped nanocrystalline silicon carbide reported here.

KW - Crystallite silicon films

KW - Deposition conditions

KW - Hot wire technique

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AN - SCOPUS:0032064398

VL - 227-230

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EP - 905

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

IS - PART 2

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