Role of annealing environment on the performances of large area ITO films produced by rf magnetron sputtering

Research output: Contribution to journalArticlepeer-review

51 Citations (Scopus)
Original languageEnglish
Pages (from-to)271-276
Number of pages6
JournalThin Solid Films
Volume487
Issue number1-2
DOIs
Publication statusPublished - 1 Sep 2005

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