Polycrystalline silicon obtained by metal induced crystallization using different metals

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35 Citations (Scopus)

Abstract

The aim of this paper is to study the role of different metals (aluminium, molybdenum, nickel and titanium) in inducing crystallization in films produced by LPCVD at high and low temperature processes and to compare the structural, morphological, optical and electrical properties of the various films produced. This work envisages the use of the most suitable conditions that lead to the production of films for optoelectronic applications such as solar cells.
Original languageEnglish
Pages (from-to)334-339
Number of pages6
JournalThin Solid Films
Volume451-52
Issue numberNA
DOIs
Publication statusPublished - 22 Mar 2004

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