TY - JOUR
T1 - Plasma-enabled multifunctional platform for gram-scale production of graphene and derivatives
AU - Dias , Ana
AU - Felizardo, Edgar
AU - Bundaleska, Neli
AU - Abrashev, Miroslav
AU - Kissovski, Jivko
AU - Ferraria, Ana M.
AU - Rego, Ana M.
AU - Strunskus, Thomas
AU - Carvalho, Patrícia A.
AU - Almeida, Amélia
AU - Zavašnik, Janez
AU - Kovacevic, Eva
AU - Berndt, Johannes
AU - Bundaleski, Nenad
AU - Ammar, Mohammed Ramzi
AU - Teodoro, Orlando M. N. D.
AU - Cvelbar, Uroš
AU - Alves, Luís L.
AU - Gonçalves, Bruno
AU - Tatarova, Elena
N1 - Funding Information:
info:eu-repo/grantAgreement/EC/H2020/766894/EU#
info:eu-repo/grantAgreement/FCT/3599-PPCDT/PTDC%2FNAN-MAT%2F30565%2F2017/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F04565%2F2020/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F04565%2F2020/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/LA%2FP%2F0140%2F2020/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F50010%2F2020/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F50010%2F2020/PT#
info:eu-repo/grantAgreement/FCT/3599-PPCDT/CERN%2FFIS-TEC%2F0039%2F2019/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F00068%2F2020/PT#
info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F00068%2F2020/PT#
This work was performed in the framework of the PEGASUS (Plasma Enabled and Graphene Allowed Synthesis of Unique nano-Structures) project, funded by European Union's Horizon 2020 research and innovation program under grant agreement No 766894 . Work partially funded by Portuguese FCT - Fundação para a Ciência e a Tecnologia , through project Eager ( PTDC/NAN-MAT/30565/2017 ), iBB and i4HB projects (UIDB/04565/2020, UIDP/04565/2020 and LA/P/0140/2020), and strategic projects UIDB/50010/2020 and UIDP/50010/2020, CEFITEC project LOWSEY (CERN/FIS-TEC/0039/2019), strategic projects (UIDB/00068/2020 and UIDP/00068/2020) and CeFEMA Project UID/CTM/04540/2020. A.M. Ferraria thanks Instituto Superior Técnico for Scientific Employment contract IST-ID/131/2018. F.M. Dias, and I. Dionisio are acknowledged for technical assistance. A. Jagodar, A. Stolz, N. M. Santosh are acknowledged for their assistance regarding graphene printing. The authors would like to thank HZB for the allocation of synchrotron radiation beam time at Bessy II via projects 222-11637-ST and 221-10805-ST on HE-SGM beamline with PREVAC endstation as well as the personnel at BESSY II, for support during our activities at the HE-SGM beamline, and Professor Dr. Ch. Wöll and Dr. A. Nefedov for providing the endstation.
Publisher Copyright:
© 2024
PY - 2024/2
Y1 - 2024/2
N2 - Taking advantage of the high-energy-density microwave plasma environment as a unique 3D space for the self-assembly of free-standing nanostructures, a novel multifunctional platform for the continuous production of graphene and derivatives at the gram scale was developed. The platform is supported by a prototype plasma machine capable of performing a wide variety of industrially applicable processes within a single assembly environment. Free-standing graphene and nitrogen doped graphene, i.e., N-graphene nanosheets, and hybrid nanocomposites are assembled in a one-step process in seconds under atmospheric pressure conditions without the need of post-treatment. A single custom-designed machine enables the synthesis of an extensive array of hybrid nanomaterials featuring metal nanoparticles anchored in graphene. The method enables the conversion of a wide range of low-cost feedstock (e.g., ethanol, acetonitrile, etc.) into graphene and derivatives at a rate up to 30 mg/min. The resulting N-graphene sheets exhibit high quality, as evidenced by the highest reported presence of single atomic layers (45%), high ratio of 2D/G peak intensities in Raman spectra and N/O atomic ratio greater than one. The use of the obtained N-graphene in low secondary electron emission applications and in inkjet printing are explored. The presented plasma machine embodies significant potential to increase the effectiveness of plasma-driven process regarding productivity, costs and turnaround time.
AB - Taking advantage of the high-energy-density microwave plasma environment as a unique 3D space for the self-assembly of free-standing nanostructures, a novel multifunctional platform for the continuous production of graphene and derivatives at the gram scale was developed. The platform is supported by a prototype plasma machine capable of performing a wide variety of industrially applicable processes within a single assembly environment. Free-standing graphene and nitrogen doped graphene, i.e., N-graphene nanosheets, and hybrid nanocomposites are assembled in a one-step process in seconds under atmospheric pressure conditions without the need of post-treatment. A single custom-designed machine enables the synthesis of an extensive array of hybrid nanomaterials featuring metal nanoparticles anchored in graphene. The method enables the conversion of a wide range of low-cost feedstock (e.g., ethanol, acetonitrile, etc.) into graphene and derivatives at a rate up to 30 mg/min. The resulting N-graphene sheets exhibit high quality, as evidenced by the highest reported presence of single atomic layers (45%), high ratio of 2D/G peak intensities in Raman spectra and N/O atomic ratio greater than one. The use of the obtained N-graphene in low secondary electron emission applications and in inkjet printing are explored. The presented plasma machine embodies significant potential to increase the effectiveness of plasma-driven process regarding productivity, costs and turnaround time.
KW - Graphene applications
KW - Graphene/n-graphene
KW - Hybrids
KW - Microwave plasmas
KW - Self-assembly
UR - http://www.scopus.com/inward/record.url?scp=85182901000&partnerID=8YFLogxK
U2 - 10.1016/j.apmt.2024.102056
DO - 10.1016/j.apmt.2024.102056
M3 - Article
AN - SCOPUS:85182901000
SN - 2352-9407
VL - 36
JO - Applied Materials Today
JF - Applied Materials Today
M1 - 102056
ER -