Abstract
Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.
| Original language | English |
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| Title of host publication | Advanced Materials Forum |
| Pages | 1274-1278 |
| Number of pages | 5 |
| Volume | 514-516 |
| Publication status | Published - 1 Jan 2006 |
| Event | 3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) - Duration: 1 Jan 2005 → … |
Conference
| Conference | 3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) |
|---|---|
| Period | 1/01/05 → … |
Keywords
- Optical emission spectroscopy
- Thin films
- Shape memory alloy
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Silva, M., Gordo, P. R., Maneira, M. J. D. P., & Braz Fernandes, F. M. (2006). Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering. In Advanced Materials Forum (Vol. 514-516, pp. 1274-1278)