Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering

Mária Silva; Paulo R. Gordo; Manuel Joaquim da Paula  Maneira; Francisco Manuel Braz Fernandes

Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering

Mária Silva, Paulo R. Gordo, Manuel Joaquim da Paula Maneira, Francisco Manuel Braz Fernandes

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.

Original language	English
Title of host publication	Advanced Materials Forum
Pages	1274-1278
Number of pages	5
Volume	514-516
Publication status	Published - 1 Jan 2006
Event	3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) - Duration: 1 Jan 2005 → …

Conference

Conference	3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM)
Period	1/01/05 → …

Keywords

Optical emission spectroscopy
Thin films
Shape memory alloy

Cite this

@inproceedings{f3b60e5da67b48c79d9d61d54ef18824,

title = "Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering",

abstract = "Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.",

keywords = "Thin Films, Optical Emission Spectroscopy, Shape Memory Alloy, Optical emission spectroscopy, Thin films, Shape memory alloy",

author = "M{\'a}ria Silva and Gordo, {Paulo R.} and Maneira, {Manuel Joaquim da Paula} and {Braz Fernandes}, {Francisco Manuel}",

year = "2006",

month = jan,

day = "1",

language = "English",

volume = "514-516",

pages = "1274--1278",

booktitle = "Advanced Materials Forum",

note = "3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) ; Conference date: 01-01-2005",

}

TY - GEN

T1 - Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering

AU - Silva, Mária

AU - Gordo, Paulo R.

AU - Maneira, Manuel Joaquim da Paula

AU - Braz Fernandes, Francisco Manuel

PY - 2006/1/1

Y1 - 2006/1/1

N2 - Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.

AB - Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.

KW - Thin Films

KW - Optical Emission Spectroscopy

KW - Shape Memory Alloy

KW - Optical emission spectroscopy

KW - Thin films

KW - Shape memory alloy

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-37849014555&origin=inward&txGid=6f6717f5bbce778c97266cfdc187903d#

M3 - Conference contribution

VL - 514-516

SP - 1274

EP - 1278

BT - Advanced Materials Forum

T2 - 3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM)

Y2 - 1 January 2005

ER -

Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering

Abstract

Conference

Keywords

Other files and links

Fingerprint

Cite this