Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, the peak temperature being 40ºC, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 - 4 Torr, without polarization and with - 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.
Original languageEnglish
Title of host publicationAdvanced Materials Forum
Pages1274-1278
Number of pages5
Volume514-516
Publication statusPublished - 1 Jan 2006
Event3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) -
Duration: 1 Jan 2005 → …

Conference

Conference3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM)
Period1/01/05 → …

Keywords

  • Optical emission spectroscopy
  • Thin films
  • Shape memory alloy

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    Silva, M., Gordo, P. R., Maneira, M. J. D. P., & Braz Fernandes, F. M. (2006). Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering. In Advanced Materials Forum (Vol. 514-516, pp. 1274-1278)