TY - JOUR
T1 - Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4
AU - Hoshino, Masamitsu
AU - Matejcik, Stefan
AU - Nunes, Yuri Fonseca da Silva
AU - da Silva, FF
AU - Limão-vieira, Paulo Manuel Assis Loureiro
PY - 2011/1/1
Y1 - 2011/1/1
N2 - Negative ion formation by low-energy electron impact to germane (GeH 4) has been performed in an electron energy region from 6 to 11 eV with an energy resolution of ∼500 meV. Anion efficiency curves of four anions have been measured. Product anions are observed mainly in the 6-11 eV energy region, yielding GeHx- (x = 0-3). Comparative studies with methane (CH4) and silane (SiH4) are also presented with the most intense signals observed at 14 amu (CH2 -), 31 amu (SiH3-) and 75 amu (GeH 3-) from CH4, SiH4 and GeH 4, respectively. Fragmentation into these negative ions is attributed to resonant dissociative electron attachment processes.
AB - Negative ion formation by low-energy electron impact to germane (GeH 4) has been performed in an electron energy region from 6 to 11 eV with an energy resolution of ∼500 meV. Anion efficiency curves of four anions have been measured. Product anions are observed mainly in the 6-11 eV energy region, yielding GeHx- (x = 0-3). Comparative studies with methane (CH4) and silane (SiH4) are also presented with the most intense signals observed at 14 amu (CH2 -), 31 amu (SiH3-) and 75 amu (GeH 3-) from CH4, SiH4 and GeH 4, respectively. Fragmentation into these negative ions is attributed to resonant dissociative electron attachment processes.
KW - CVD and plasma etching
KW - Silane (SiH4)
KW - Germane (GeH4)
KW - Negative ion formation
KW - Methane (CH4)
KW - Dissociative electron attachment
KW - Silane (SiH4)
KW - CVD and plasma etching
KW - Dissociative electron attachment
KW - Germane (GeH 4)
KW - Methane (CH4)
KW - Negative ion formation
UR - http://www.scopus.com/record/display.uri?eid=2-s2.0-80051905942&origin=resultslist&sort=plf-f&src=s&st1
U2 - 10.1016/j.ijms.2011.06.009
DO - 10.1016/j.ijms.2011.06.009
M3 - Article
SN - 1387-3806
VL - 306
SP - 51
EP - 56
JO - International Journal of Mass Spectrometry
JF - International Journal of Mass Spectrometry
IS - 1
ER -