Negative ion formation by low-energy electron impact to germane (GeH 4) has been performed in an electron energy region from 6 to 11 eV with an energy resolution of ∼500 meV. Anion efficiency curves of four anions have been measured. Product anions are observed mainly in the 6-11 eV energy region, yielding GeHx- (x = 0-3). Comparative studies with methane (CH4) and silane (SiH4) are also presented with the most intense signals observed at 14 amu (CH2 -), 31 amu (SiH3-) and 75 amu (GeH 3-) from CH4, SiH4 and GeH 4, respectively. Fragmentation into these negative ions is attributed to resonant dissociative electron attachment processes.
- Silane (SiH4)
- CVD and plasma etching
- Dissociative electron attachment
- Germane (GeH 4)
- Methane (CH4)
- Negative ion formation
Hoshino, M., Matejcik, S., Nunes, Y. F. D. S., da Silva, FF., & Limão-vieira, P. M. A. L. (2011). Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4. International Journal of Mass Spectrometry, 306(1), 51-56. https://doi.org/10.1016/j.ijms.2011.06.009