Nd-YAG laser induced crystallization on a-Si:H thin films

J. Carvalho, I. Ferreira, B. Fernandes, J. Fidalgo, R. Martins

Research output: Contribution to journalConference article

2 Citations (Scopus)

Abstract

In this paper we present results concerning the influence of laser energy and shot density on the electrical resistance, X-ray diffraction pattern, and structure obtained by SEM, on recrystallized a-Si:H thin films produced by using a Nd-YAG laser, working in a wavelength of 532 nm. The base material (undoped and doped a-Si:H) was obtained by Plasma Enhanced Chemical Vapour Deposition (PECVD). The structure and electrical characteristics of the recrystallized thin films are dependent on the laser beam energy density, beam spot size and the number of shots applied to the base a-Si:H thin film used. Overall, the data show recrystallized material with grain sizes larger than 1μm, where the electrical resistance of both, undoped and doped materials, can be varied up to 5 orders of magnitude, by the proper choice of the recrystallization conditions.

Original languageEnglish
Pages (from-to)915-920
Number of pages6
JournalMaterials Research Society Symposium Proceedings
Volume358
Publication statusPublished - 1995
Event1994 MRS Fall Meeting - Boston, United States
Duration: 28 Nov 199430 Nov 1994

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