Multilayer thin-film coatings based on chromium nitride and aluminum nitride: Comparative depth profiling by secondary ion mass spectrometry and glow-discharge optical emission spectrometry

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Abstract

Round-robin characterization is reported on the sputter depth profiling of CrN/AlN multilayer thin-film coatings on nickel alloy by secondary ion mass spectrometry (SIMS) and glow-discharge optical emission spectrometry (GD-OES). It is demonstrated that a CAMECA SIMS 4550 Depth Profiler operated with 3 keV O (2) (+) primary ions provides the best depth resolution and sensitivity. The key factor is sample rotation, which suppresses the negative influence of the surface topography (initial and ion-induced) on the depth profile characteristics.
Original languageUnknown
Pages (from-to)1370-1376
JournalJournal Of Analytical Chemistry
Volume65
Issue number13
DOIs
Publication statusPublished - 1 Jan 2010

Keywords

    Cite this

    @article{38886c44c4db4d98af15cd7a821bee68,
    title = "Multilayer thin-film coatings based on chromium nitride and aluminum nitride: Comparative depth profiling by secondary ion mass spectrometry and glow-discharge optical emission spectrometry",
    abstract = "Round-robin characterization is reported on the sputter depth profiling of CrN/AlN multilayer thin-film coatings on nickel alloy by secondary ion mass spectrometry (SIMS) and glow-discharge optical emission spectrometry (GD-OES). It is demonstrated that a CAMECA SIMS 4550 Depth Profiler operated with 3 keV O (2) (+) primary ions provides the best depth resolution and sensitivity. The key factor is sample rotation, which suppresses the negative influence of the surface topography (initial and ion-induced) on the depth profile characteristics.",
    keywords = "round-robin, nitride, (GD-OES), mass, oxidation, potiling, ion, sims, air, resolution, secondary, (SIMS), emission, multilayer, coatings, depth, high-temperature, discharge, spectrometry, sputtering, glow, characterization, optical",
    author = "Alexander Tolstoguzov",
    year = "2010",
    month = "1",
    day = "1",
    doi = "10.1134/S1061934810130101",
    language = "Unknown",
    volume = "65",
    pages = "1370--1376",
    journal = "Journal Of Analytical Chemistry",
    issn = "1061-9348",
    publisher = "Springer Science Business Media",
    number = "13",

    }

    TY - JOUR

    T1 - Multilayer thin-film coatings based on chromium nitride and aluminum nitride: Comparative depth profiling by secondary ion mass spectrometry and glow-discharge optical emission spectrometry

    AU - Tolstoguzov, Alexander

    PY - 2010/1/1

    Y1 - 2010/1/1

    N2 - Round-robin characterization is reported on the sputter depth profiling of CrN/AlN multilayer thin-film coatings on nickel alloy by secondary ion mass spectrometry (SIMS) and glow-discharge optical emission spectrometry (GD-OES). It is demonstrated that a CAMECA SIMS 4550 Depth Profiler operated with 3 keV O (2) (+) primary ions provides the best depth resolution and sensitivity. The key factor is sample rotation, which suppresses the negative influence of the surface topography (initial and ion-induced) on the depth profile characteristics.

    AB - Round-robin characterization is reported on the sputter depth profiling of CrN/AlN multilayer thin-film coatings on nickel alloy by secondary ion mass spectrometry (SIMS) and glow-discharge optical emission spectrometry (GD-OES). It is demonstrated that a CAMECA SIMS 4550 Depth Profiler operated with 3 keV O (2) (+) primary ions provides the best depth resolution and sensitivity. The key factor is sample rotation, which suppresses the negative influence of the surface topography (initial and ion-induced) on the depth profile characteristics.

    KW - round-robin

    KW - nitride

    KW - (GD-OES)

    KW - mass

    KW - oxidation

    KW - potiling

    KW - ion

    KW - sims

    KW - air

    KW - resolution

    KW - secondary

    KW - (SIMS)

    KW - emission

    KW - multilayer

    KW - coatings

    KW - depth

    KW - high-temperature

    KW - discharge

    KW - spectrometry

    KW - sputtering

    KW - glow

    KW - characterization

    KW - optical

    U2 - 10.1134/S1061934810130101

    DO - 10.1134/S1061934810130101

    M3 - Article

    VL - 65

    SP - 1370

    EP - 1376

    JO - Journal Of Analytical Chemistry

    JF - Journal Of Analytical Chemistry

    SN - 1061-9348

    IS - 13

    ER -