Abstract
Multi-level resistive switching characteristics of a Cu₂O/Al₂O₃ bilayer device are presented. An oxidation state gradient in copper oxide induced by the fabrication process was found to play a dominant role in defining the multiple resistance states. The highly conductive grain boundaries of the copper oxide-an unusual property for an oxide semiconductor-are discussed for the first time regarding their role in the resistive switching mechanism.
| Original language | English |
|---|---|
| Article number | 289 |
| Journal | Nanomaterials |
| Volume | 9 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 19 Feb 2019 |
Keywords
- resistive switching memories
- multi-level cell
- copper oxide
- grain boundaries
- aluminum oxide
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