Microwave N                         
                        2
                                                 -Ar plasmas applied for N-graphene post synthesis

N. Bundaleska; N. Bundaleski; Ana Paula Soares Dias; F. M. Dias; M. Abrashev; G. Filipič; U. Cvelbar; Z. Rakočević; Zh Kissovski; Júlio A. P. Henriques; E. Tatarova

doi:10.1088/2053-1591/aad7e9

Microwave N ₂ -Ar plasmas applied for N-graphene post synthesis

N. Bundaleska, N. Bundaleski, Ana Paula Soares Dias, F. M. Dias, M. Abrashev, G. Filipič, U. Cvelbar, Z. Rakočević, Zh Kissovski, Júlio A. P. Henriques, E. Tatarova

DF – Departamento de Física

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N ₂ microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N ₂ about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C ₃ N ₄ has been synthesized.

Original language	English
Article number	095605
Journal	Materials Research Express
Volume	5
Issue number	9
DOIs	https://doi.org/10.1088/2053-1591/aad7e9
Publication status	Published - 1 Sept 2018

Keywords

carbon nitrides
microwave plasma
N-graphene
post synthesis

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10.1088/2053-1591/aad7e9Licence: CC BY-NC-ND

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Bundaleska, N., Bundaleski, N., Dias, A. P. S., Dias, F. M., Abrashev, M., Filipič, G., Cvelbar, U., Rakočević, Z., Kissovski, Z., Henriques, J. A. P., & Tatarova, E. (2018). Microwave N ₂ -Ar plasmas applied for N-graphene post synthesis. Materials Research Express, 5(9), Article 095605. https://doi.org/10.1088/2053-1591/aad7e9

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title = "Microwave N 2 -Ar plasmas applied for N-graphene post synthesis",

abstract = " High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N 2 microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N 2 about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C 3 N 4 has been synthesized. ",

keywords = "carbon nitrides, microwave plasma, N-graphene, post synthesis",

author = "N. Bundaleska and N. Bundaleski and Dias, {Ana Paula Soares} and Dias, {F. M.} and M. Abrashev and G. Filipi{\v c} and U. Cvelbar and Z. Rako{\v c}evi{\'c} and Zh Kissovski and Henriques, {J{\'u}lio A. P.} and E. Tatarova",

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doi = "10.1088/2053-1591/aad7e9",

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Bundaleska, N, Bundaleski, N, Dias, APS, Dias, FM, Abrashev, M, Filipič, G, Cvelbar, U, Rakočević, Z, Kissovski, Z, Henriques, JAP & Tatarova, E 2018, 'Microwave N ₂ -Ar plasmas applied for N-graphene post synthesis', Materials Research Express, vol. 5, no. 9, 095605. https://doi.org/10.1088/2053-1591/aad7e9

TY - JOUR

T1 - Microwave N 2 -Ar plasmas applied for N-graphene post synthesis

AU - Bundaleska, N.

AU - Bundaleski, N.

AU - Dias, Ana Paula Soares

AU - Dias, F. M.

AU - Abrashev, M.

AU - Filipič, G.

AU - Cvelbar, U.

AU - Rakočević, Z.

AU - Kissovski, Zh

AU - Henriques, Júlio A. P.

AU - Tatarova, E.

N1 - info:eu-repo/grantAgreement/EC/H2020/766894/EU# info:eu-repo/grantAgreement/FCT/5876/147211/PT# Project INCENTIVO/FIS/LA0010/2014, SFRH/BD/52413/2013 (PD-F APPLAuSE), Ministry of Education and Science of the Republic of Serbia through the project III 45005.

PY - 2018/9/1

Y1 - 2018/9/1

N2 - High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N 2 microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N 2 about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C 3 N 4 has been synthesized.

AB - High level of nitrogen doping (∼25%) of free-standing graphene sheets was achieved using the remote region of a Ar-N 2 microwave plasmas. The relation between the percentage of nitrogen in the plasma and the characteristics of the treated samples has been investigated. Structural changes, being mainly created at the surface of graphene, increase significantly with the percentage of nitrogen in the gas mixture. For a mixture containing 5% of N 2 about 2.7 at. % of nitrogen was incorporated in the form of imide group and graphitic bonds (70%), and as N bound to sp3 carbon (30%). Increasing the nitrogen amount to 40% results in the production of samples with up to 25% of incorporated nitrogen. Formation of new types of carbon-nitride structures has also been observed. Detailed x-ray Photoelectron Spectroscopy and Transmission Electron Microscopy analysis support the hypothesis that a structure similar to β-C 3 N 4 has been synthesized.

KW - carbon nitrides

KW - microwave plasma

KW - N-graphene

KW - post synthesis

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DO - 10.1088/2053-1591/aad7e9

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AN - SCOPUS:85052332764

SN - 2053-1591

VL - 5

JO - Materials Research Express

JF - Materials Research Express

IS - 9

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ER -

Microwave N ₂ -Ar plasmas applied for N-graphene post synthesis

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Keywords

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