Lithographic mask defects analysis on an MMI 3 dB splitter

Paulo Lourenço, Alessandro Fantoni, João Costa, Manuela Vieira

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)
19 Downloads (Pure)


In this paper, we present a simulation study that intends to characterize the influence of defects introduced by manufacturing processes on the geometry of a semiconductor structure suitable to be used as a multimode interference (MMI) 3 dB power splitter. Consequently, these defects will represent refractive index fluctuations which, on their turn, will drastically affect the propagation conditions within the structure. Our simulations were conducted on a software platform that implements the Beam Propagation numerical method. This work supports the development of a biomedical plasmonic sensor, which is based on the coupling between propagating modes in a dielectric waveguide and the surface plasmon mode that is generated on an overlaid metallic thin film, and where the output readout is achieved through an a-Si:H photodiode. By using a multimode interference 1 × 2 power splitter, this sensor device can utilize the non-sensing arm as a reference one, greatly facilitating its calibration and enhancing its performance. As the spectral sensitivity of amorphous silicon is restricted to the visible range, this sensing device should be operating on a wavelength not higher than 700 nm; thus, a-SiNx has been the material hereby proposed for both waveguides and MMI power splitter.

Original languageEnglish
Article number118
Issue number4
Publication statusPublished - 1 Jan 2019


  • 3 dB splitter
  • A-SiNx
  • Beam propagation method
  • Multimode interference


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