Ion-plasma treatment of reed switch contacts: A study by time-of-flight secondary ion mass spectrometry

A. B. Tolstoguzov, M. N. Drozdov, I. A. Zeltser, K. A. Arushanov, Orlando M N D Teodoro

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A TOF.SIMS-5 time-of-flight secondary ion mass spectrometer operating with pulsed 25-keV Bi+ ions for analysis and 2-keV Cs+ ions for sputter ion-beam etching was employed for studying the near-surface composition of iron-nickel (permalloy) contacts (blades) after the treatment in pulsed nitrogen plasma directly in hermetically sealed reed switches. The formation of 20- to 25-nm thick oxynitride coatings in the contacting region of the blades was observed. It was found that this coating was of the diffusive nature and produced via the plasma nitriding of the contacts.

Original languageEnglish
Pages (from-to)1245-1251
Number of pages7
JournalJournal Of Analytical Chemistry
Volume69
Issue number13
DOIs
Publication statusPublished - 12 Dec 2014

Keywords

  • cathode sputtering
  • ion nitriding
  • ion-plasma treatment
  • reed switch
  • sputter depth profiling
  • time-of-flight secondary ion mass spectrometry

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