Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

I. Baía; Francisco Manuel Braz Fernandes; Patrícia Nunes; M. Quintela; Rodrigo Ferrão de Paiva Martins

doi:10.1016/S0040-6090(00)01589-3

Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

I. Baía, Francisco Manuel Braz Fernandes, Patrícia Nunes, M. Quintela, Rodrigo Ferrão de Paiva Martins

Research output: Contribution to journal › Article › peer-review

34 Citations (Scopus)

Abstract

This paper presents results of the role of the oxygen concentration (C_O) and the deposition pressure (p_d) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by C_O than by p_d, the same does not happen with the electrical properties.

Original language	English
Pages (from-to)	244-247
Number of pages	4
Journal	Thin Solid Films
Volume	383
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(00)01589-3
Publication status	Published - 15 Feb 2001

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title = "Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films",

abstract = "This paper presents results of the role of the oxygen concentration (CO) and the deposition pressure (pd) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by CO than by pd, the same does not happen with the electrical properties.",

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T1 - Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

AU - Baía, I.

AU - Fernandes, Francisco Manuel Braz

AU - Nunes, Patrícia

AU - Quintela, M.

AU - Martins, Rodrigo Ferrão de Paiva

PY - 2001/2/15

Y1 - 2001/2/15

N2 - This paper presents results of the role of the oxygen concentration (CO) and the deposition pressure (pd) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by CO than by pd, the same does not happen with the electrical properties.

AB - This paper presents results of the role of the oxygen concentration (CO) and the deposition pressure (pd) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by CO than by pd, the same does not happen with the electrical properties.

KW - reannealing

KW - texture

KW - indium tin oxide

KW - annealing

KW - r.f. magnetron sputtering

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EP - 247

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -

Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

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