Influence of the deposition conditions on the properties of titanium oxide produced by r.f. magnetron sputtering

Research output: Contribution to journalArticle

14 Citations (Scopus)
Original languageEnglish
Pages (from-to)243-247
Number of pages5
JournalMaterials Science in Semiconductor Processing
Volume7
Issue number4-6
DOIs
Publication statusPublished - 1 Jan 2004

Cite this