In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy

R. F. M. Lobo, M. A. Pereira da Silva, M. Raposo, R. M. Faria, O. N. Oliveira

Research output: Contribution to journalArticle

84 Citations (Scopus)

Abstract

A method for direct in situ thickness measurements of ultra-thin soft polymer films is presented in which an atomic force microscope (AFM) tip is used to create a furrow in the film, whereby the thickness is determined by scanning the sample across the furrow with the AFM. The sample does not need to be moved since the scratching and the measurements are performed with the same apparatus. This `furrow method' is applied to layer-by-layer polymer/polyelectrolyte ultra-thin films onto hydrophilic glass and silicon wafer substrates. This procedure is made possible because the polymeric film is less stiff than the substrates and the silicon tip. Results for 10-12-bilayer films are comparable to those obtained from profilometry, whose accuracy is only reasonable for films with more than ten bilayers. Taken together, the AFM and profilometer results show that film thickness increases linearly with the number of bilayers. Furthermore, the film thickness does not seem to depend on the substrate used but only on the number of bilayers deposited.

Original languageEnglish
Pages (from-to)389-393
Number of pages5
JournalNanotechnology
Volume10
Issue number4
DOIs
Publication statusPublished - Dec 1999

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Thickness measurement
Multilayer films
Polymer films
Atomic force microscopy
Microscopes
atomic force microscopy
Film thickness
microscopes
polymers
Substrates
Profilometry
film thickness
Ultrathin films
Silicon
Polyelectrolytes
Silicon wafers
profilometers
polymeric films
Polymers
silicon

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Lobo, R. F. M. ; Silva, M. A. Pereira da ; Raposo, M. ; Faria, R. M. ; Oliveira, O. N. / In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy. In: Nanotechnology. 1999 ; Vol. 10, No. 4. pp. 389-393.
@article{4f94a07538de4c6d812bc11b558b47b4,
title = "In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy",
abstract = "A method for direct in situ thickness measurements of ultra-thin soft polymer films is presented in which an atomic force microscope (AFM) tip is used to create a furrow in the film, whereby the thickness is determined by scanning the sample across the furrow with the AFM. The sample does not need to be moved since the scratching and the measurements are performed with the same apparatus. This `furrow method' is applied to layer-by-layer polymer/polyelectrolyte ultra-thin films onto hydrophilic glass and silicon wafer substrates. This procedure is made possible because the polymeric film is less stiff than the substrates and the silicon tip. Results for 10-12-bilayer films are comparable to those obtained from profilometry, whose accuracy is only reasonable for films with more than ten bilayers. Taken together, the AFM and profilometer results show that film thickness increases linearly with the number of bilayers. Furthermore, the film thickness does not seem to depend on the substrate used but only on the number of bilayers deposited.",
author = "Lobo, {R. F. M.} and Silva, {M. A. Pereira da} and M. Raposo and Faria, {R. M.} and Oliveira, {O. N.}",
year = "1999",
month = "12",
doi = "10.1088/0957-4484/10/4/305",
language = "English",
volume = "10",
pages = "389--393",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "Iop Publishing Ltd",
number = "4",

}

In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy. / Lobo, R. F. M.; Silva, M. A. Pereira da; Raposo, M.; Faria, R. M.; Oliveira, O. N.

In: Nanotechnology, Vol. 10, No. 4, 12.1999, p. 389-393.

Research output: Contribution to journalArticle

TY - JOUR

T1 - In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy

AU - Lobo, R. F. M.

AU - Silva, M. A. Pereira da

AU - Raposo, M.

AU - Faria, R. M.

AU - Oliveira, O. N.

PY - 1999/12

Y1 - 1999/12

N2 - A method for direct in situ thickness measurements of ultra-thin soft polymer films is presented in which an atomic force microscope (AFM) tip is used to create a furrow in the film, whereby the thickness is determined by scanning the sample across the furrow with the AFM. The sample does not need to be moved since the scratching and the measurements are performed with the same apparatus. This `furrow method' is applied to layer-by-layer polymer/polyelectrolyte ultra-thin films onto hydrophilic glass and silicon wafer substrates. This procedure is made possible because the polymeric film is less stiff than the substrates and the silicon tip. Results for 10-12-bilayer films are comparable to those obtained from profilometry, whose accuracy is only reasonable for films with more than ten bilayers. Taken together, the AFM and profilometer results show that film thickness increases linearly with the number of bilayers. Furthermore, the film thickness does not seem to depend on the substrate used but only on the number of bilayers deposited.

AB - A method for direct in situ thickness measurements of ultra-thin soft polymer films is presented in which an atomic force microscope (AFM) tip is used to create a furrow in the film, whereby the thickness is determined by scanning the sample across the furrow with the AFM. The sample does not need to be moved since the scratching and the measurements are performed with the same apparatus. This `furrow method' is applied to layer-by-layer polymer/polyelectrolyte ultra-thin films onto hydrophilic glass and silicon wafer substrates. This procedure is made possible because the polymeric film is less stiff than the substrates and the silicon tip. Results for 10-12-bilayer films are comparable to those obtained from profilometry, whose accuracy is only reasonable for films with more than ten bilayers. Taken together, the AFM and profilometer results show that film thickness increases linearly with the number of bilayers. Furthermore, the film thickness does not seem to depend on the substrate used but only on the number of bilayers deposited.

UR - http://www.scopus.com/inward/record.url?scp=0033341347&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/10/4/305

DO - 10.1088/0957-4484/10/4/305

M3 - Article

VL - 10

SP - 389

EP - 393

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 4

ER -