In-situ study of the preferential orientation of magnetron sputtered ni-ti thin films as a function of bias and substrate type

Rui M. S. Martins, Norbert Schell, Manfred Beckers, Arndt Mücklich, Helfried Reuther, Rui J.C. Silva, Karimbi K. Mahesh, F. M.Braz Fernandes

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The preferential orientation of Ni-Ti thin films is a crucial factor in determining the shape memory behaviour. The texture has a strong influence on the extent of the strain recovery. The relationship between structure and deposition parameters is of extreme importance for future device applications. Our approach is in-situ x-ray diffraction during deposition carried out in a process chamber installed at a synchrotron radiation beamline. Near-equiatomic films were co-sputtered from Ni-Ti and Ti targets. Substrate type and bias voltage play an important role for the preferred orientation. On naturally oxidized Si(100) substrates the Ni-Ti B2 phase starts by stacking onto (hOO) planes and then changes to <110> fibre texture with increasing film thickness. For thermally oxidized Si(100) substrates, this cross-over is only observed when a substrate bias voltage is applied. The experiments were supplemented by ex-situ transmission electron microscopy and Auger electron spectroscopy allowing an additional deeper insight into the film/substrate interface.

Original languageEnglish
Title of host publicationSMST-2006
Subtitle of host publicationProceedings of the International Conference on Shape Memory and Superelastic Technologies
Pages363-372
Number of pages10
DOIs
Publication statusPublished - 2008
EventInternational Conference on Shape Memory and Superelastic Technologies, SMST-2006 - Pacific Grove, CA, United States
Duration: 7 May 200611 May 2006

Conference

ConferenceInternational Conference on Shape Memory and Superelastic Technologies, SMST-2006
Country/TerritoryUnited States
CityPacific Grove, CA
Period7/05/0611/05/06

Keywords

  • Shape-memory alloy
  • Synchrotron-radiation scattering
  • Deposition
  • Texture
  • Growth
  • Silicon
  • Mems

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