High near-infrared transparency and carrier mobility of Mo doped In2O3 thin films for optoelectronics applications

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Molybdenum (0-1 at. %) doped indium oxide thin films with high near-infrared (NIR) transparency and high carrier mobility were deposited on Corning-1737 glass substrates at 400 degrees C by a spray pyrolysis experimental technique. X-ray diffraction (XRD) analysis confirmed the cubic bixbyite structure of indium oxide. The preferred growth orientation along the (222) plane for the low Mo doping level (<= 0.5 at. %) shifts to (400) for higher Mo doping levels (>0.6 at. % ). The crystallite size extracted from the XRD data corroborates the changes in full width at half maximum due to the variation in Mo doping. A scanning electron microscopy study illustrated the evolution in the surface microstructure as a function of Mo doping. The negative sign of the Hall coefficient confirmed the n-type conductivity. A high carrier mobility of similar to 122.4 cm(2)/V s, a carrier concentration of similar to 9.5 x 10(19) cm(-3), a resistivity of similar to 5.3 x 10(-4) Omega cm, and a high figure of merit of similar to 4.2 x 10(-2) Omega(-1) are observed for the films deposited with 0.5 at. % Mo. The obtained high average transparency of similar to 83% in the wavelengths ranging from 400 to 2500 nm confirmed the extension of transmittance well into the NIR region.
Original languageUnknown
Pages (from-to)nr. 063716
JournalJournal of Applied Physics
Issue number6
Publication statusPublished - 1 Jan 2009

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