High-mobility p-type NiOx thin-film transistors processed at low temperatures with Al2O3 high-k dielectric

Fukai Shan, Ao Liu, Huihui Zhu, Weijin Kong, Jingquan Liu, Byoungchul Shin, Elvira Fortunato, Rodrigo Martins, Guoxia Liu

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57 Citations (Scopus)

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