Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz

Research output: Contribution to journalArticle

1 Citation (Scopus)
Original languageEnglish
Pages (from-to)532-535
Number of pages4
JournalAdvanced Materials Forum Iii, Pts 1 And 2
Volume455-456
Issue numberNA
DOIs
Publication statusPublished - 1 Jan 2004

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