Abstract
The possibility of fabricating high-mobility ZnO thin-film transistors (ZnO-TFT) at room temperature by rf magnetron sputtering was discussed. It was found that the films were nanocrystalline with a hexagonal structure and exhibited a preferred orientation with the c-axis perpendicular to the substrate. The undoped ZnO films exhibited improved crystallinity fraction of the nanocrystals and low oxygen vacancies. Analysis shows that the exposure of the ZnO-TFTs to the ambient light has no effect on the current voltage characteristics.
| Original language | English |
|---|---|
| Pages (from-to) | 590-594 |
| Number of pages | 5 |
| Journal | Advanced Materials |
| Volume | 17 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 8 Mar 2005 |
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