FIB patterning of dielectric, metallized and graphene membranes

A comparative study

A. Hemamouche, A. Morin, E. Bourhis, B. Toury, E. Tarnaud, J. Mathé, P. Guégan, A. Madouri, X. Lafosse, C. Ulysse, S. Guilet, G. Patriarche, L. Auvray, F. Montel, Q. Wilmart, B. Plaçais, J. Yates, J. Gierak

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Fabrication of nanopores and nanomasks has recently emerged as an area of considerable interest for research applications ranging from optics, to electronics and to biophysics. In this work we evaluate and compare the fabrication of nanopores, using a finely focused gallium beam, in free-standing membranes/films made of Si, SiN, and SiO2 (having thicknesses of a few tens of nanometers) and also in graphene and hexagonal boron nitride (h-BN) atomically thin suspended sheets. Mechanical resistance, charging effects and patterning performances are evaluated and compared. In spite of the very different properties of the membranes we report that reproducible nanopore fabrication in the sub-10 nm range can be achieved in both amorphous and atomically thin sheets using Ga+ focused ion beams (FIB).

Original languageEnglish
Pages (from-to)87-91
Number of pages5
JournalMicroelectronic Engineering
Volume121
DOIs
Publication statusPublished - 1 Jun 2014

Fingerprint

Nanopores
Graphite
Focused ion beams
Graphene
graphene
ion beams
membranes
Membranes
Fabrication
fabrication
Biophysics
biophysics
Gallium
Boron nitride
boron nitrides
gallium
charging
Optics
Electronic equipment
optics

Keywords

  • Boron nitride
  • Dielectric films
  • FIB
  • Graphene
  • Nanopores
  • Ultra-thin membranes

Cite this

Hemamouche, A., Morin, A., Bourhis, E., Toury, B., Tarnaud, E., Mathé, J., ... Gierak, J. (2014). FIB patterning of dielectric, metallized and graphene membranes: A comparative study. Microelectronic Engineering, 121, 87-91. https://doi.org/10.1016/j.mee.2014.03.020
Hemamouche, A. ; Morin, A. ; Bourhis, E. ; Toury, B. ; Tarnaud, E. ; Mathé, J. ; Guégan, P. ; Madouri, A. ; Lafosse, X. ; Ulysse, C. ; Guilet, S. ; Patriarche, G. ; Auvray, L. ; Montel, F. ; Wilmart, Q. ; Plaçais, B. ; Yates, J. ; Gierak, J. / FIB patterning of dielectric, metallized and graphene membranes : A comparative study. In: Microelectronic Engineering. 2014 ; Vol. 121. pp. 87-91.
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Hemamouche, A, Morin, A, Bourhis, E, Toury, B, Tarnaud, E, Mathé, J, Guégan, P, Madouri, A, Lafosse, X, Ulysse, C, Guilet, S, Patriarche, G, Auvray, L, Montel, F, Wilmart, Q, Plaçais, B, Yates, J & Gierak, J 2014, 'FIB patterning of dielectric, metallized and graphene membranes: A comparative study', Microelectronic Engineering, vol. 121, pp. 87-91. https://doi.org/10.1016/j.mee.2014.03.020

FIB patterning of dielectric, metallized and graphene membranes : A comparative study. / Hemamouche, A.; Morin, A.; Bourhis, E.; Toury, B.; Tarnaud, E.; Mathé, J.; Guégan, P.; Madouri, A.; Lafosse, X.; Ulysse, C.; Guilet, S.; Patriarche, G.; Auvray, L.; Montel, F.; Wilmart, Q.; Plaçais, B.; Yates, J.; Gierak, J.

In: Microelectronic Engineering, Vol. 121, 01.06.2014, p. 87-91.

Research output: Contribution to journalArticle

TY - JOUR

T1 - FIB patterning of dielectric, metallized and graphene membranes

T2 - A comparative study

AU - Hemamouche, A.

AU - Morin, A.

AU - Bourhis, E.

AU - Toury, B.

AU - Tarnaud, E.

AU - Mathé, J.

AU - Guégan, P.

AU - Madouri, A.

AU - Lafosse, X.

AU - Ulysse, C.

AU - Guilet, S.

AU - Patriarche, G.

AU - Auvray, L.

AU - Montel, F.

AU - Wilmart, Q.

AU - Plaçais, B.

AU - Yates, J.

AU - Gierak, J.

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PY - 2014/6/1

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N2 - Fabrication of nanopores and nanomasks has recently emerged as an area of considerable interest for research applications ranging from optics, to electronics and to biophysics. In this work we evaluate and compare the fabrication of nanopores, using a finely focused gallium beam, in free-standing membranes/films made of Si, SiN, and SiO2 (having thicknesses of a few tens of nanometers) and also in graphene and hexagonal boron nitride (h-BN) atomically thin suspended sheets. Mechanical resistance, charging effects and patterning performances are evaluated and compared. In spite of the very different properties of the membranes we report that reproducible nanopore fabrication in the sub-10 nm range can be achieved in both amorphous and atomically thin sheets using Ga+ focused ion beams (FIB).

AB - Fabrication of nanopores and nanomasks has recently emerged as an area of considerable interest for research applications ranging from optics, to electronics and to biophysics. In this work we evaluate and compare the fabrication of nanopores, using a finely focused gallium beam, in free-standing membranes/films made of Si, SiN, and SiO2 (having thicknesses of a few tens of nanometers) and also in graphene and hexagonal boron nitride (h-BN) atomically thin suspended sheets. Mechanical resistance, charging effects and patterning performances are evaluated and compared. In spite of the very different properties of the membranes we report that reproducible nanopore fabrication in the sub-10 nm range can be achieved in both amorphous and atomically thin sheets using Ga+ focused ion beams (FIB).

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KW - Dielectric films

KW - FIB

KW - Graphene

KW - Nanopores

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U2 - 10.1016/j.mee.2014.03.020

DO - 10.1016/j.mee.2014.03.020

M3 - Article

VL - 121

SP - 87

EP - 91

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

ER -