Etchability Dependence of InO x and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions

Ana Amaral, G. Lavareda, C. Nunes de Carvalho, V. André, Yuri Vygranenko, M. Fernandes, Pedro Brogueira

Research output: Contribution to journal › Article › peer-review

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