Engineering of plasma deposition systems used for producing large area a-Si:H devices

R. Martins; I. Ferreira; Nilton M. Carvalho; L. Guimarães

doi:10.1016/S0022-3093(05)80231-5

Engineering of plasma deposition systems used for producing large area a-Si:H devices

R. Martins, I. Ferreira, Nilton M. Carvalho, L. Guimarães

Research output: Contribution to journal › Article

11 Citations (Scopus)

Abstract

One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

Original language	English
Pages (from-to)	757-760
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	137-138
Issue number	PART 2
DOIs	https://doi.org/10.1016/S0022-3093(05)80231-5
Publication status	Published - 1991

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title = "Engineering of plasma deposition systems used for producing large area a-Si:H devices",

abstract = "One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.",

author = "R. Martins and I. Ferreira and Carvalho, {Nilton M.} and L. Guimar{\~a}es",

note = "We also wish to express our gratitude to the financial support obtained by CEC project contract n -° JOUR-0077-C (TT/OASIS) and by Programa Espec[fico de Desenvolvimento da Ind0stria Portuguesa, n -° 0038.",

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AU - Martins, R.

AU - Ferreira, I.

AU - Carvalho, Nilton M.

AU - Guimarães, L.

N1 - We also wish to express our gratitude to the financial support obtained by CEC project contract n -° JOUR-0077-C (TT/OASIS) and by Programa Espec[fico de Desenvolvimento da Ind0stria Portuguesa, n -° 0038.

PY - 1991

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AB - One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

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JO - Journal of Non-Crystalline Solids

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