Abstract
One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.
| Original language | English |
|---|---|
| Pages (from-to) | 757-760 |
| Number of pages | 4 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 137-138 |
| Issue number | PART 2 |
| DOIs | |
| Publication status | Published - 1991 |
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Martins, R., Ferreira, I., Carvalho, N. M., & Guimarães, L. (1991). Engineering of plasma deposition systems used for producing large area a-Si:H devices. Journal of Non-Crystalline Solids, 137-138(PART 2), 757-760. https://doi.org/10.1016/S0022-3093(05)80231-5