Engineering of plasma deposition systems used for producing large area a-Si:H devices

R. Martins, I. Ferreira, Nilton M. Carvalho, L. Guimarães

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

Original languageEnglish
Pages (from-to)757-760
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume137-138
Issue numberPART 2
DOIs
Publication statusPublished - 1991

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