Engineering of plasma deposition systems used for producing large area a-Si:H devices

R. Martins; I. Ferreira; Nilton M. Carvalho; L. Guimarães

doi:10.1016/S0022-3093(05)80231-5

Engineering of plasma deposition systems used for producing large area a-Si:H devices

R. Martins, I. Ferreira, Nilton M. Carvalho, L. Guimarães

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

Original language	English
Pages (from-to)	757-760
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	137-138
Issue number	PART 2
DOIs	https://doi.org/10.1016/S0022-3093(05)80231-5
Publication status	Published - 1991

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@article{807ddcdcb4304658b431fee7cd53cfd2,

title = "Engineering of plasma deposition systems used for producing large area a-Si:H devices",

abstract = "One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.",

author = "R. Martins and I. Ferreira and Carvalho, {Nilton M.} and L. Guimar{\~a}es",

note = "We also wish to express our gratitude to the financial support obtained by CEC project contract n -° JOUR-0077-C (TT/OASIS) and by Programa Espec[fico de Desenvolvimento da Ind0stria Portuguesa, n -° 0038.",

year = "1991",

doi = "10.1016/S0022-3093(05)80231-5",

language = "English",

volume = "137-138",

pages = "757--760",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier",

number = "PART 2",

}

TY - JOUR

T1 - Engineering of plasma deposition systems used for producing large area a-Si:H devices

AU - Martins, R.

AU - Ferreira, I.

AU - Carvalho, Nilton M.

AU - Guimarães, L.

N1 - We also wish to express our gratitude to the financial support obtained by CEC project contract n -° JOUR-0077-C (TT/OASIS) and by Programa Espec[fico de Desenvolvimento da Ind0stria Portuguesa, n -° 0038.

PY - 1991

Y1 - 1991

N2 - One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

AB - One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

UR - http://www.scopus.com/inward/record.url?scp=0040387195&partnerID=8YFLogxK

U2 - 10.1016/S0022-3093(05)80231-5

DO - 10.1016/S0022-3093(05)80231-5

M3 - Article

AN - SCOPUS:0040387195

VL - 137-138

SP - 757

EP - 760

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

IS - PART 2

ER -

Engineering of plasma deposition systems used for producing large area a-Si:H devices

Abstract

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