Electron interaction cross sections for CF3I, C2F4, and CFx (x=1-3) radicals

Iryna Rozum, Paulo Manuel Assis Loureiro Limão-vieira, Samuel Eden, Jonathan Tennyson, Nigel J. Mason

Research output: Contribution to journalArticlepeer-review

68 Citations (Scopus)

Abstract

The supply of absolute electron-impact cross sections for molecular targets and radicals is extremely important for developing plasma reactors and testing different types of etching gases. Current demand for such models is high as the industry aims to replace traditional plasma processing gases with less polluting species. New theoretical electron impact cross sections at typical etching plasma energies (sub 10 eV) are presented for the CFx (x= 1-3) active radical species in a form suitable for plasma modeling. The available experimental and theoretical data are summarized for two potential feed gases, CF3I and C2F4. This data cover recommended cross sections for electron scattering (total, excitation, momentum transfer, and elastic integral), electron impact dissociation, and dissociative electron attachment, wherever possible. Numerical values are given as tables in the paper and are also placed in the electronic archive.
Original languageEnglish
Pages (from-to)267-284
Number of pages18
JournalJournal Of Physical And Chemical Reference Data
Volume35
Issue number1
DOIs
Publication statusPublished - 1 Jan 2006

Keywords

  • Resonances
  • Technological plasmas
  • Cross sections
  • Dissociative electron attachment
  • Electron molecule collisions
  • Electronic excitation
  • Ionization

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