Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature

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Abstract

In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4-PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm(2) C-1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cm(-2) and 1.4 s cm(-2), respectively.
Original languageEnglish
Pages (from-to)109-115
Number of pages7
JournalSolar Energy Materials and Solar Cells
Volume120
Issue numberSI
DOIs
Publication statusPublished - Jan 2014

Keywords

  • Nickel oxide
  • Electrochromic devices
  • Thermal evaporation
  • Chromogenic materials

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