Detailed phisyco-chemical characterization of the multilayered thin films based on titanium oxynitride and copper doped titanium nitride obtained by different PVD techniques

Thin films on the base of titanium oxynitrides and copper doped titanium nitride were obtained by a combination of different PVD techniques on the surface of glass substrate and their physicochemical properties were analyzed in details. Phase composition of the samples was analyzed by XRD and FTIR methods, while microstructure of the samples was analyzed by SEM. XPS was used for depth profiling of the samples, which enabled determination of the oxidative state of titanium and corresponding phases through various film layers from the surface to the substrate. The depth of the various layers and their extinction coefficients and refractory indexes were estimated by spectroscopic ellipsometry.