Design of a Ring-Amplifier Robust Against PVT Variations in Deep-Nanoscale FinFET CMOS

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

This paper describes the design and the electrical simulation results, at device level, of a proposed ring-Amplifier (RINGAMP) for industrial applications. The proposed topology has been fairly compared with other topologies presented in literature, showing better static (open-loop DC gain with less variability), dynamic performance (both, SNR and THD) and robustness against PVT corners and presenting a faster response. The simulated key performance parameters demonstrate to be compatible with the required specifications for a residue amplifier to be readily employed in the context of a 10-bit high-speed two-stage pipeline ADC.

Original languageEnglish
Title of host publication36th Conference on Design of Circuits and Integrated Systems, DCIS 2021
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages11-15
ISBN (Electronic)9781665421164
DOIs
Publication statusPublished - 2021
Event36th Conference on Design of Circuits and Integrated Systems, DCIS 2021 - Vila do Conde, Portugal
Duration: 24 Nov 202126 Nov 2021

Publication series

NameConference on Design of Circuits and Integrated Systems DCIS
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISSN (Print)2471-6170
ISSN (Electronic)2640-5563

Conference

Conference36th Conference on Design of Circuits and Integrated Systems, DCIS 2021
Country/TerritoryPortugal
CityVila do Conde
Period24/11/2126/11/21

Keywords

  • FinFET CMOS
  • Multi-Stage Pipeline ADCs
  • Residue-Amplifier
  • Ring-Amplifier
  • RINGAMP

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