Corrosion resistance analysis of aluminium-doped zinc oxide layers deposited by pulsed magnetron sputtering

E. G-Berasategui, R. Bayón, C. Zubizarreta, J. Barriga, R. Barros, R. Martins, E. Fortunato

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

In this paper an exhaustive analysis is performed on the electrochemical corrosion resistance of Al-doped ZnO (AZO) layers deposited on silicon wafers by a DC pulsed magnetron sputtering deposition technique to test layer durability. Pulse frequency of the sputtering source was varied and a detailed study of the electrochemical corrosion response of samples in the presence of a corrosive chloride media (NaCl 0.06 M) was carried out. Electrochemical impedance spectroscopy measurements were performed after reaching a stable value of the open circuit at 2 h, 192 h and 480 h intervals. Correlation of the corrosion resistance properties with the morphology, and the optical and electrical properties was tested. AZO layers with transmission values higher than 84% and resistivity of 6.54 × 10- 4 â. cm for a deposition process pressure of 3 × 10- 1 Pa, a sputtering power of 2 kW, a pulse frequency of 100 kHz, with optimum corrosion resistance properties, were obtained.

Original languageEnglish
Pages (from-to)256-260
Number of pages5
JournalTHIN SOLID FILMS
Volume594
DOIs
Publication statusPublished - 2 Nov 2015

Keywords

  • Aluminum-doped zinc oxide
  • Corrosion properties
  • Direct-current magnetron sputtering
  • Electrochemical impedance spectroscopy
  • Thin films
  • Transparent conductive films

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