TY - JOUR
T1 - Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique
AU - Martins, Rodrigo Ferrão de Paiva
AU - Silva, Vitor
AU - Águas, Hugo Manuel Brito
AU - Cabrita, Ana
AU - Ferreira, Isabel Maria Mercês
AU - Fortunato, Elvira Maria Correia
PY - 2001/12/12
Y1 - 2001/12/12
N2 - This paper deals with the determination of plasma impedance and ion density in r.f. plasmas using different mixtures of silane with methane or ethylene and r.f. powers. The aim is to correlate these parameters with carbon and hydrogen contents of the films produced. The data achieved show that the best carbon incorporation is achieved using ethylene gas mixtures, under low gas mixture concentration, where the substrate also sustains a low ion bombardment. The data also show that particulates in the plasma can be more easily formed in the ethylene-based processes.
AB - This paper deals with the determination of plasma impedance and ion density in r.f. plasmas using different mixtures of silane with methane or ethylene and r.f. powers. The aim is to correlate these parameters with carbon and hydrogen contents of the films produced. The data achieved show that the best carbon incorporation is achieved using ethylene gas mixtures, under low gas mixture concentration, where the substrate also sustains a low ion bombardment. The data also show that particulates in the plasma can be more easily formed in the ethylene-based processes.
U2 - 10.1016/S0169-4332(01)00483-4
DO - 10.1016/S0169-4332(01)00483-4
M3 - Article
SN - 0169-4332
VL - 184
SP - 101
EP - 106
JO - Applied Surface Science
JF - Applied Surface Science
IS - 1-4
ER -