Conducting indium oxide films on plastic substrates by plasma enhanced reactive thermal evaporation

Y. Vygranenko, M. Fernandes, M. Vieira, G. Lavareda, C. Nunes de Carvalho, P. Brogueira, A. Amaral

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


This work reports on low temperature deposition of conducting indium oxide films by a radio-frequency plasma enhanced reactive thermal evaporation (rf-PERTE) technique. The films were deposited on polyethylene terephthalate (PET) without intentional heating of the substrate and at elevated temperatures up to 150 °C. The material stoichiometry was accurately controlled by adjusting deposition conditions including the oxygen flow, process pressure, pumping speed, and RF-power. Besides, fine turning of the critical deposition parameters during the deposition was implemented by measuring the variation of film conductance in-situ. The film morphology was analyzed by scanning electron microscopy. Hall effect measurements were also performed to determine the relation between the deposition conditions and the electrical properties of the films. A resistivity of 4 × 10−4 Ω-cm was reached under optimized deposition conditions. A 250 nm-thick coating with 16 Ω/sq sheet resistance shows an 82% peak value of transmittance in the visible spectral range.

Original languageEnglish
Article number137604
JournalThin Solid Films
Publication statusPublished - 1 Dec 2019


  • Electrical properties
  • Flexible electronics
  • Indium oxide
  • Optical properties
  • Reactive thermal evaporation
  • Thin-films


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