Combined in-situ XRD and Electrical Resistivity Study of the Phase Transformations in Ni-Ti SMA

Research output: Book/ReportCommissioned report


The proposal for the experimental session was drafted with a view to approach a combination of characterization techniques, wherein, the acquisition of the X-ray diffraction (XRD) and the electrical resistivity (ER) measurement will be made during the thermal induced phase transformations in Ni-Ti shape memory alloys (SMAs). Specimen were mounted on the 6-circle goniometer. ER measurement was carried out by employing HL5500 Hall system. Electrical probes are contacted with the specimen in Vander Pauw configuration as shown in Fig. 1. X-ray energy is set to 11.5keV. Samples S32 (Ni-Ti thin film (~ 720 nm thick) on SiO2/Si(100) from ME-1087, April, 2005) and S23 (Ni-Ti thin film (~ 800 nm thick) on SiO2/Si(110) from ME-936, Feb, 2005) specimens were tested.
Original languageUnknown
PublisherUnknown Publisher
Publication statusPublished - 1 Jan 2011

Cite this