Characterization of zinc oxide thin films deposited by rf magnetron sputtering on Mylar substrates

Elvira Fortunato, Patrícia Nunes, António Marques, Daniel Costa, Hugo Águas, Isabel Ferreira, Maria E V Costa, Rodrigo Martins

Research output: Contribution to journalArticle

Abstract

Aluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10-2 Ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.

Original languageEnglish
Pages (from-to)F3211-F3216
Number of pages6
JournalMRS Proceedings
Volume666
Publication statusPublished - 2001

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