Chemistry
Silicon Carbide
78%
Chemical Vapour Deposition
63%
Ion Impact
59%
Electron Temperature
54%
Amorphous Silicon
47%
Plasma Enhanced Chemical Vapour Deposition
42%
Bulk Density
41%
Ellipsometry
38%
Deposition Technique
38%
Deposition Process
38%
Density of State
37%
Gas
37%
Liquid Film
34%
Silane
33%
Valence
30%
Mixture
30%
Methane
27%
Dissociation
25%
Plasma
21%
Electron Particle
19%
Hydrogen
17%
Reduction
16%
Surface
11%
Engineering & Materials Science
Plasma enhanced chemical vapor deposition
100%
Silicon carbide
75%
Thin films
66%
Spectroscopic ellipsometry
42%
Electron temperature
40%
Amorphous silicon
32%
Silanes
30%
Phase composition
28%
Gas mixtures
26%
Controllability
24%
Electrons
23%
Methane
21%
Plasmas
21%
Ions
21%
Hydrogen
18%
Defects
16%
Gases
13%
Physics & Astronomy
silicon carbides
68%
vapor deposition
54%
characterization
39%
thin films
36%
photoelectronics
33%
ion impact
30%
controllability
27%
silanes
25%
ellipsometry
22%
excitation
22%
gas mixtures
22%
amorphous silicon
21%
methane
21%
radio frequencies
20%
dissociation
19%
vapor phases
18%
electron energy
17%
valence
17%
hydrogen
14%
defects
13%
electrons
9%