Application of thin film technology to optical sensors

E. Fortunato; G. Lavareda; M. Vieira; R. Martins; L. Ferreira

doi:10.1016/0042-207X(94)90050-7

Application of thin film technology to optical sensors

E. Fortunato, G. Lavareda, M. Vieira, R. Martins, L. Ferreira

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper we present results of PIN single and dual axis Thin Film Position Sensitive Detectors (TFPSD) based on hydrogenated amorphous silicon (a-Si:H) technology, with a wide detection area (up to 80 × 80 mm). These sensors provide an alternative to Charge Coupled Devices (CCDs) when large inspection areas are needed, under a requirement to use simpler technology. In this paper we analyse the forward and reverse I-V characteristics in the dark and under illumination, as well as the device linearity of TFPSD.

Original language	English
Pages (from-to)	1151-1154
Number of pages	4
Journal	Vacuum
Volume	45
Issue number	10-11
DOIs	https://doi.org/10.1016/0042-207X(94)90050-7
Publication status	Published - 1994

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author = "E. Fortunato and G. Lavareda and M. Vieira and R. Martins and L. Ferreira",

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AU - Lavareda, G.

AU - Vieira, M.

AU - Martins, R.

AU - Ferreira, L.

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AB - In this paper we present results of PIN single and dual axis Thin Film Position Sensitive Detectors (TFPSD) based on hydrogenated amorphous silicon (a-Si:H) technology, with a wide detection area (up to 80 × 80 mm). These sensors provide an alternative to Charge Coupled Devices (CCDs) when large inspection areas are needed, under a requirement to use simpler technology. In this paper we analyse the forward and reverse I-V characteristics in the dark and under illumination, as well as the device linearity of TFPSD.

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JO - Vacuum

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IS - 10-11

ER -

Application of thin film technology to optical sensors

Abstract

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