Amorphous silicon-based PINIP structure for color sensor

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Abstract

A series of hydrogenated amorphous silicon carbide (a-SiC:H) films was prepared by plasma enhanced chemical vapor deposition (PECVD) technology. The microstructure and photoelectronic properties of the film are investigated by absorption spectra (in the ultraviolet to near-infrared range) and Fourier transform infrared (FTIR) spectra. The results show that good band gap controllability (1.83- 3.64 eV) was achieved by adjusting the plasma parameters. In the energy range around 2.1 eV. the a-Si1-xCx:H films exhibit good photosensitivity, opening the possibility to use this wide band gap material for device application, especially when blue color detectors are concerned. A multilayer device with a stack of glass/TCO(ZnO:Ga)/P(a-SiC:H)/I(a-SiC:H)/N(a-Si:H)/I(a-Si:H)/P(a-Si:H)/Al has been prepared. The devices can detect blue and red colors under different bias voltages. The optimization of the device, especially thefilm thickness and the band gap offset used to achieve better detectivity, is also done in this work. (C) 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)268-270
Number of pages3
JournalTHIN SOLID FILMS
Volume487
Issue number1-2
Publication statusPublished - 1 Sep 2005

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