Advanced materials for the next generation of thin film transistors

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Citations (Scopus)


Staggered bottom gate transparent thin film transistors (TTFTs) have been produced by rf magnetron sputtering at room temperature, using amorphous indium-zinc-oxide (IZO) semiconductor, for the channel as well as for the drain and source regions. The obtained TTFTs operate in the enhancement mode with threshold voltages of 2.4 V, saturation mobility of 22.7 cm(2)/Vs, gate voltage swing of 0.44 V/dec and an ON/OFF current ratio of 7x10(7). The high performances presented by these TTFTs produced at room temperature, make these TFTs a promising candidate for flexible, wearable, disposable portable electronics as well as battery-powered applications.
Original languageUnknown
Title of host publicationIdmc'07: Proceedings of the International Display Manufacturing Conference 2007
EditorsCH Chen, YS Tsai
Publication statusPublished - 1 Jan 2007
Event7th International Display Manufacturing Conference (IDMC 07) -
Duration: 1 Jan 2007 → …


Conference7th International Display Manufacturing Conference (IDMC 07)
Period1/01/07 → …

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