A next generation TCO material for display systems: Molybdenum doped indium oxide thin films

Thin films of indium molybdenum oxide (IMO) were rf sputtered onto glass substrates at room temperature. The films were studied as a function of sputtering power (ranging 40-180 W) and sputtering time (ranging 2.5-20 min). Thickness of the films found varied between 50-400 nm. The films were characterized for their structural (XRD), electrical (Hall measurements) and optical (Transmittance spectra) properties. XRD studies revealed that the films are amorphous for the sputtering power ≤ 100 W and deposition time ≤ 5 min. All the other films are polycrystalline and the strongest refection along (222) plane showing a preferential orientation. A minimum bulk resistivity of 2.65 × 10^-3 Ω-cm and a maximum carrier concentration of 4.16 × 10²⁰ cm^-3 have been obtained for the films sputtered at 180 W (10 min). Whereas maximum mobility (19.5 cm² V^-1 s^-1) has been obtained for the films sputtered at 80 W (10 min). A maximum visible transmittance of 90% (500 nm) has been obtained for the films sputtered at 80 W (10 min) with a minimum of 27% for those sputtered at 180 W. The optical band gap of the films found varying between 3.75 and 3.90 eV for various sputtering parameters.