3D soft microlithography in segmented anisotropic urethane/urea elastomers

M. H. Godinho, A. C. Trindade, J. L. Figueirinhas, L. V. Melo, P. Brogueira

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)


In this work we describe a way to readily transfer 2D pictures from a mask to 3D structures on flexible free standing urethane/urea substrates. The resultant 3D picture can easily be erased/rewritten or permanently imprinted in the elastomer. The 3D microstructures are induced by UV radiation and can be revealed by application of a mechanical field or by immersing and drying the elastomer in an appropriate solvent. The film casting conditions induces an orientational order of the segregated soft and hard parts of the copolymer that is enhanced by UV radiation which is thought to make up the anisotropic structure that is responsible for the features observed. The copolymer is prepared by extending a poly(propylene oxide)-based triisocyanate terminated prepolymer (PU) with poly(butadienediol) (PBDO; 40% wt). Polarising Optical Microscopy (POM), Small Angle Light Scattering (SALS) and Atomic Force Microscopy (AFM) were used to evidence the different nano and micromodulated structures that develop in urethane/urea elastomer. The measurements were performed before and after applying a mechanical field and after immersion and drying the sample on toluene.

Original languageEnglish
Pages (from-to)53/[1297]-61/[1305]
JournalMolecular Crystals and Liquid Crystals
Publication statusPublished - 1 Dec 2005
Event20th Biennial International Liquid Crystal Conference - Ljubljana, Slovenia
Duration: 4 Jul 20049 Jul 2004


  • AFM
  • Elastomers
  • SALS
  • Soft lithography
  • Urethane/urea


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