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Highly conductive p-type nanocrystalline silicon films deposited by RF-PECVD using silane and trimethylboron mixtures at high pressure
Filonovich, S. A., Águas, H., Bernacka-Wojcik, I., Gaspar, C., Vilarigues, M., Silva, L. B., Fortunato, E. & Martins, R., 16 Jun 2009, In: Vacuum. 83, 10, p. 1253-1256 4 p.Research output: Contribution to journal › Article › peer-review
32 Link opens in a new tab Citations (Scopus)