António C. Marques

Researcher, DCM - Departamento de Ciência dos Materiais
Researcher, CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)
Researcher, UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias

DCM - Departamento de Ciência dos Materiais Faculdade de Ciências e Tecnologia/UNL Edifício II Campus de Caparica 2829-516 Caparica
Portugal
2829-51 Caparica
Portugal

Source: Scopus
Calculated based on no. of publications stored in Pure and citations from Scopus

Research output per year

If you made any changes in Pure these will be visible here soon.

Fingerprint

Dive into the research topics where António C. Marques is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

35 Similar Profiles

48 Citations
1 h-Index
2 Conference article
1 Article

Polycrystalline intrinsic zinc oxide to be used in transparent electronic devices
Pimentel, A., Fortunato, E., Gonçalves, A., Marques, A. C., Águas, H., Pereira, L., Ferreira, I. & Martins, R., 1 Sep 2005, In : Thin Solid Films. 487, 1-2, p. 212-215 4 p.
Research output: Contribution to journal › Conference article
47 Citations (Scopus)
Characterization of transparent and conductive ZnO:Ga thin films produced by rf sputtering at room temperature
Fortunato, E., Assunção, V. A., Marques, A., Ferreira, I., Águas, H., Pereira, L. & Martins, R., 8 Dec 2003, In : Materials Research Society Symposium - Proceedings. 763, p. 225-230 6 p.
Research output: Contribution to journal › Conference article
1 Citation (Scopus)
Thin film metal oxide semiconductors deposited on polymeric substrates
Fortunato, E., Nunes, P. J., Marques, A., Costa, D., Águas, H., Ferreira, I., Costa, M. E. V. & Martins, R., 1 Jan 2001, In : Materials Research Society Symposium - Proceedings. 666, p. F1131-F1136 6 p.
Research output: Contribution to journal › Article

Polycrystalline intrinsic zinc oxide to be used in transparent electronic devices

Characterization of transparent and conductive ZnO:Ga thin films produced by rf sputtering at room temperature

Thin film metal oxide semiconductors deposited on polymeric substrates